We are proud to feature our recent publication, “Patterning Indium Tin Oxide Using Self-Assembled Monolayers as Etch Resists for Photovoltaic and Display Devices,” in ACS Applied Nano Materials. This work presents important advances in the use of SAMs as etch resist and reflects our efforts to address challenges in pattering ITO.

DOI: 10.1021/acsanm.2c00602

https://pubs.acs.org/aanmf6/issue/5/5